Rapidly reduce particles and vent times in load lock and transfer chambers and feature an efficient and robust Ni disk membrane.

• Rated at 1,000,000 cycles and designed to operate at higher inlet pressures
• Patented, sintered nickel technology in a compact diffuser unit provides superior performance in all applications
• Removes particles greater than 0.0015 µm from incoming gas, minimizing wafer defects
• Easily installed/retrofitted into existing tools minimizes downtime

Chambergard™ FV50D XL Gas Diffuser Applications

• Provide rapid gas venting to atmosphere without disturbing or adding particles to wafers in the chamber