All-in-one purifying filter provides ultraclean purification for aggressive solvents, yielding superior particle retention and metal removal efficiency.

• 5 nm retention rating PTFE membrane is optimized for aggressive chemistry applications
• Exclusive metal removal layer sustains purification performance for a long time with maximized metal removal capacity
• All-in-one device removes both particles and metals with high efficiency, reducing footprint
• All-fluoropolymer materials enable ultraclean purification
• UCM10P and UCM16P optimized cleaning method enables rapid start-up after installation
• Flexible device portfolio includes cartridges and small and large disposable formats

Protego® AT 5 nm Purifier Applications

• Aggressive solvent (like IPA) applications requiring highly efficient metal removal and extreme cleanliness
• Sub-16 nm device nodes, wafer fab equipment, and bulk chemical delivery systems
• Bulk chemical manufacturers supplying chemistries for leading-edge microelectronics market