Maximizes metal removal efficiencies over a broad range of photochemical solvents and raw materials used in photochemical manufacturing.

• Novel functionalization allows greater than 99% metal removal for certain chemicals
• Improved cleanliness creates a cleaner substrate, enabling shorter filter conditioning time
• Optimized morphology extends filter lifetime
• Broader application proves effective in most commonly used photochemical solvent

Purasol™ LS2 Solvent Purifier Applications

• Photolithography solvents
• Raw materials and intermediates (resin, polymer solutions, etc.) used in photochemical manufacturing