Designed for high-performance filtration of bulk ultrapure and DI water in facilities and point-of-tool applications.

• High-porosity, PTFE membrane enables high flow rate performance and reduces operational costs without sacrificing retention
• Next generation surface modification enhances contamination removal
• Small pore size membrane design enables advanced particle removal and increases yield
• High density polyethylene (HDPE) construction lowers extractables and ensures clean filtration operations

Trinzik™ UPW T015 Ultrapure Water Filter Applications

Designed for ultrapure and DI water filtration in bulk facilities and point-of-tool applications within the semiconductor, hard disk drive manufacturing, flat panel display (LCD, LED, OLED, AMOLED, plasma) and solar/photovoltaic industries including:

• Make-up loops
• Polish loops
• UPW final filtration/UF alternative
• Resin trap and general process tool water
• Low cost of ownership alternative to ultrafiltration (UF)
• Advanced UF guard filters