These PS6 catalyst and adsorber bulk gas purifiers efficiently remove numerous impurities with high reliability, low cost, and high performance.

• Uses dual catalytic and adsorption processes designed specifically to provide ultra-high purity gas for semiconductor applications
• Hydrocarbons (CH₄), carbon monoxide (CO), and hydrogen (H₂) react at elevated temperatures with oxygen (O₂) in the oxidizing catalyst vessel to form carbon dioxide (CO₂) and water (H₂O), which are then removed in the ambient temperature adsorber vessel.
• Two adsorber vessels alternate between purify and regeneration modes, providing continuous purification
• Adsorber regeneration is accomplished by back flushing purified O₂ at an elevated temperature
• Optimized design provides sub-ppb performance in small footprints with flow rates up to 16,667 slpm (1,000 Nm³/hr)