These PS9 catalyst and adsorber bulk gas purifiers efficiently remove numerous impurities with high reliability, low cost, and high performance.

• Uses dual catalytic and adsorption processes designed specifically to provide ultra-high purity gas for semiconductor applications
• Hydrocarbons (CH₄), carbon monoxide (CO), and hydrogen (H₂) react at elevated temperatures with oxygen (O₂) or extreme clean dry air (XCDA^®) in the oxidizing catalyst vessel to form carbon dioxide (CO₂) and water (H₂O), which, along with O₂ are then removed in the ambient temperature adsorber vessel.
• Two adsorber vessels alternate between purify and regeneration modes, providing continuous purification
• Adsorber regeneration is accomplished by back flushing with a mixture of purified process gas and low concentration H₂ at an elevated temperature
• Optimized design provides sub-ppb performance in small footprints with flow rates up to 200,000 slpm (12,000 Nm³/hr)