Efficiently removes both dissolved and colloidal metal contaminants from a variety of ultrapure, polar and nonpolar solvents including difficult to remove ketones like cyclohexanone.

• Materials of construction provide broad chemical compatibility to most organic photochemical solvents
• Two distinct purification media types ensure total metal removal in both polar and nonpolar solvents
• UPE purification media provides superior cleanliness compared to other purifier technologies

Purasol™ SP/SN Solvent Purifiers Applications

• Photolithography solvents
• Raw materials (resin, polymer solutions, etc.) used in photochemical manufacturing