Efficiently removes both dissolved and colloidal metal contaminants from a variety of ultrapure, polar and nonpolar solvents including difficult to remove ketones like cyclohexanone.
Materials of construction provide broad chemical compatibility to most organic photochemical solvents
Two distinct purification media types ensure total metal removal in both polar and nonpolar solvents
UPE purification media provides superior cleanliness compared to other purifier technologies
Purasol™ SP/SN Solvent Purifiers Applications
Photolithography solvents
Raw materials (resin, polymer solutions, etc.) used in photochemical manufacturing