Ideal for high-purity gas systems when high particle removal efficiency is desired and all stainless steel construction is preferred.

• The all 316L stainless steel construction provides good chemical compatibility with most semiconductor process gases
• Specialized cleaning and high-temperature baking achieve superior initial cleanliness, enabling quick gas start-up
• High flow rate/low pressure drop characteristics are suitable for use with low vapor pressure gases
• High particle removal efficiency reduces on-wafer defects, increasing yield
• Available in standard and long (XL) lengths

Wafergard® II SF Mini/Mini XL In-line Gas Filters Applications

• Ultrapure gas lines
• High-temperature applications
• Dynamic-pressure applications
• Inert and reactive gases*
• Gas cabinets
• Gas panels
• Valve manifold boxes
• Hookup