Increase efficiency and throughput by reducing particles and vent times in load lock and transfer chambers.

• Patented, sintered nickel technology provides superior performance in all applications
• Design enables removal of particles from incoming gas greater than 0.0015 µm, minimizing wafer defects
• Provides rapid venting without disturbing or adding particles to wafers, decreasing cycle times while increasing throughput
• Combines flow characteristics of a diffuser with a high-efficiency filter to increase efficiency and throughput
• Easy retrofit/installation into existing tools minimizes downtime

Chambergard™ Fast Vent Diffusers Applications

• Provide rapid gas venting to atmosphere without disturbing or adding particles to wafers in the chamber