Designed for aggressive aqueous chemicals and solvents, these filters offer a cost-effective alternative for advanced wet etch and clean (WEC) applications.

• Retention ratings 10 µm to 15 nm remove particles from a range of acids, bases, and other process chemicals.
• Requires minimal setup time, promoting a lower cost of ownership in advanced WEC processes
• Ideal for medium- to high-flow extended lifetime applications
• Hydrophobic membrane's increased surface area improves flow rate performance with low pressure drop, and enables higher throughput and increased device yield at elevated temperatures
• PTFE/PFA fluorine resin materials are thermally bonded PFA construction ensure excellent chemical compatibility and minimize chloride and metals extractables that can impact process performance
• Cost-effective prewet cartridge filter option ships 0.9% H₂O₂ wet, which allows rapid startup in aqueous chemicals and prevents alcohol-chemical interactions

Fluorogard NX Filter Applications

• Medium- to high-flow chemical applications in both semiconductor and display market applications
• Wet etch and clean (WEC) applications/one pass and recirculation
• Bulk chemical manufacturing
• Bulk chemical delivery systems (BCDS)
• Aggressive aqueous chemistries
• Advanced solvents