Optimizer DEV disposable liquid photochemical filters are designed for developer, DI water, and solvent applications in POU photolithography processes.
Use a capsule form factor that enables high purity with minimal contamination with higher flow rate and strong retention rate performance in 28 - 65 nm technology nodes
These filters occupy less space for filter changeouts because no manifolds are needed
Integrated polypropylene housing minimizes downtime and limits hazardous chemical handling during installation
The disposable filter, with surface-modified UPE membrane, achieves maximum flow with minimal risk of microbubble formation
Optimizer® DEV Filter Applications
Industry: Semiconductor, Data Storage
Process: Photolithography, Magnetic Head - Photolithography