Optimizer DEV disposable liquid photochemical filters are designed for developer, DI water, and solvent applications in POU photolithography processes.

• Use a capsule form factor that enables high purity with minimal contamination with higher flow rate and strong retention rate performance in 28 - 65 nm technology nodes
• These filters occupy less space for filter changeouts because no manifolds are needed
• Integrated polypropylene housing minimizes downtime and limits hazardous chemical handling during installation
• The disposable filter, with surface-modified UPE membrane, achieves maximum flow with minimal risk of microbubble formation

Optimizer® DEV Filter Applications

• Industry: Semiconductor, Data Storage
• Process: Photolithography, Magnetic Head - Photolithography
• Chemistry: DI Water, Solvent, Photochemical
• Installation Point: Point of Tool